Junsun Thermal Evaporation & Sputtering coaters

Sputtering technology has good performance in film density and substrate adhesion, and the JF MGS series magnetic sputtering system is designed to take into account both convenience and with excellent performance, so that  it can be easily applied to various occasions that require vacuum coating.

For example: AlCrN films are used to harden/protect processing machines or molds, ITO transparent conductive films, UV/IR/HR/AR optical films, etc.

JF's MGS series product features are as follows:

Multi-gun sputtering source design: Confocal (confocal) or Face-to-Face (face-to-face) configuration of the sputtering source.

A variety of gas injection options, different configurations such as mixed injection, separate introduction, etc. can be adopted according to users’ needs.

The cooling channel of the sputtering source adopts a separate design to extend the life of the target and protect the magnet from corrosion.

Different sputtering technologies can be mixed at the same time (DC, RF, Pulsed-DC, Ion-assisted, Substrate Bias Mode)

The system can also be equipped with auxiliary options such as substrate rotation heater, ICP plasma source, PEM, RGA, load-lock and so on.

Four different models with various capabilities are now available in our centre:

MGS-500

MGS-800

OM-2000R